Alternative lithographic technologies III (1-3 March 2011, San Jose, California, United States)Herr, Daniel J. C.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 1 vol, isbn 978-0-8194-8529-8Conference Proceedings

Development and characterization of carbon nanotube processes for NRAM technologyAMBLARD, Gilles.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797017.1-797017.7Conference Paper

Nanoimprint Lithography for Semiconductor Devices and Future Patterning InnovationHIGASHIKI, Tatsuhiko; NAKASUGI, Tetsuro; YONEDA, Ikuo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797003.1-797003.6Conference Paper

Soft UV-NIL at the 12.5 nm ScaleKREINDL, G; KAST, M; BERGMAIR, I et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701M.1-79701M.7Conference Paper

The comparison of NGLs from a tool vendor's viewSUZUKI, Akiyoshi.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797005.1-797005.12Conference Paper

Progress in Mask Replication using Jet and Flash Imprint LithographySELINIDIS, Kosta S; BROOKS, Cynthia B; DOYLE, Gary F et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797009.1-797009.11Conference Paper

eMET: 50keV electron multibeam Mask Exposure ToolKLEIN, Christof; KLIKOVITS, Jan; LOESCHNER, Hans et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700C.1-79700C.6Conference Paper

E-Beam to Complement Optical Lithography for 1D LayoutsLAM, David K; LIU, Enden D; SMAYLING, Michael C et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797011.1-797011.8Conference Paper

Fast Mask Writers: Technology Options and ConsiderationsLITT, Lloyd C; GROVES, Timothy.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700X.1-79700X.9Conference Paper

Optimization of e-beam landing energy for EBDWLIU, Enden D; PRESCOP, Ted.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701S.1-79701S.10Conference Paper

Reactive Fluorinated Surfactant for Step and Flash Imprint LithographyOGAWA, Tsuyoshi; HELLEBUSCH, Daniel J; LIN, Michael W et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700T.1-79700T.7Conference Paper

Fast and large-field electron-beam exposure by CSELKOJIMA, A; OHTA, T; OHYI, H et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701R.1-79701R.10Conference Paper

Scatterometry Sensitivity for NIL ProcessMIYAKAWA, Takahiro; SATO, Kazuhiro; SENTOKU, Koich et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701N.1-79701N.7Conference Paper

IMAGINE: an open consortium to boost maskless lithography take off First assessment results on MAPPER technologyPAIN, L; ICARD, B; MARTIN, M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700Y.1-79700Y.11Conference Paper

Wafer-level fabrication of distributed feedback laser diodes by utilizing UV nanoimprint lithographyYANAGISAWA, Masaki; TSUJI, Yukihiro; YOSHINAGA, Hiroyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797014.1-797014.8Conference Paper

Approaches to rapid resist spreading on dispensing based UV-NILUSUKI, Kazuyuki; WAKAMATSU, Satoshi; OOMATSU, Tadashi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700S.1-79700S.8Conference Paper

Data Preparation solution for e-beam multiple pass exposure: Reaching sub-22nm nodes with a tool dedicated to 45nmMARTIN, Luc; MANAKLI, Serdar; BAYLE, Sebastien et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797019.1-797019.12Conference Paper

Development of Realistic Potentials for the Simulation of Directed Self-Assembly of PS-PMMA Di-Block CopolymersLAWSON, Richard A; LUDOVICE, Peter J; HENDERSON, Clifford L et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700N.1-79700N.10Conference Paper

Electron Beam Induced Freezing of Positive Tone, EUV Resists for Directed Self Assembly ApplicationsCHENG, Han-Hao; KEEN, Imelda; ANGUANG YU et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701V.1-79701V.9Conference Paper

Fabrication of hole pattern for position-controlled MOVPE grown GaN nanorods with highly precise nanoimprint technologyERIKSSON, Torbjörn; KI DONG LEE; HEIDARI, Babak et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797015.1-797015.9Conference Paper

Fast characterization of line end shortening and application of novel correction algorithms in e-beam direct writeFREITAG, Martin; CHOI, Kang-Hoon; GUTSCH, Manuela et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701C.1-79701C.10Conference Paper

New advances with REBL for maskless high-throughput EBDW lithographyPETRIC, Paul; BEVIS, Chris; MCCORD, Mark et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797018.1-797018.14Conference Paper

Demonstration of Real Time pattern correction for high throughput maskless lithographyHAKKENNES, E. A; WIERSMA, A. D; HOVING, M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701A.1-79701A.11Conference Paper

Double and Triple Exposure With Image Reversal in a Single Photoresist LayerNDOYE, Coumba; ORLOWSKI, Marius.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701H.1-79701H.10Conference Paper

Model-Based Mask Data Preparation (MB-MDP) and its impact on resist heatingFUJIMURA, Aki; KAMIKUBO, Takashi; BORK, Ingo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797012.1-797012.10Conference Paper